Magnetization and microstructure of Ni films prepared by dc magnetron sputtering

被引：0
|
作者：
Hanson, M. [1 ]
Margitin, A. [1 ]
Stjerna, B. [1 ]
机构：
[1] Chalmers Univ of Technology and, Goteborg Univ, Goteborg, Sweden
来源：
Journal of Magnetism and Magnetic Materials | 1995年 / 140-144卷 / pt 1期
关键词：
Coercive force - Film preparation - Magnetic fields - Magnetic moments - Magnetization - Magnetron sputtering - Microstructure - Nickel - Substrates - Thermal effects - Thickness measurement - X ray diffraction analysis;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
We prepared Ni films, about 50 nm thick, by dc magnetron sputtering. Films deposited at room temperature have saturation magnetizations, Ms, significantly reduced below the value of bulk Ni. Ms and the coercivity vary with the substrate temperature. This is interpreted as due to changes in the microstructure of the films.
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页码：701 / 702
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