Measurements of Ti atom density and Ti ion density in inductively coupled plasma enhanced magnetron sputtering

被引：0
|
作者：
Nakamura, Tadashi [1 ]
Okimura, Kunio [1 ]
机构：
[1] Department of Electronics, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan
来源：
Shinku/Journal of the Vacuum Society of Japan | 2003年 / 46卷 / 05期
关键词：
D O I：
10.3131/jvsj.46.462
中图分类号：
学科分类号：
摘要：
9
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页码：462 / 465
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