Vacuum-deposited TiNi shape memory film. Characterization and applications in microdevices

被引：96
|
作者：
Johnson, A.David [1 ]
机构：
[1] TiNi Alloy Co, Oakland, United States
来源：
Journal of Micromechanics and Microengineering | 1991年 / 1卷 / 01期
关键词：
Microdevice Shape Memory Alloys - Shape Memory Film Vacuum Deposition - Titanium Nitride Shape Memory Film - Vacuum Deposited Titanium Nitride Memory Films;
D O I：
10.1088/0960-1317/1/1/007
中图分类号：
学科分类号：
摘要：
引用
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页码：34 / 41
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