Preparation of nitrogen containing carbon films using chemical vapor deposition enhanced by electron cyclotron resonance plasma

被引：0
|
作者：
机构：
来源：
Appl Phys Lett | / 3卷 / 353期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [31] Preparation of Al-O-N films by electron cyclotron resonance plasma-assisted chemical vapor deposition
    Goto, T
    Zhang, W
    Hirai, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (6A): : 3668 - 3674
  • [32] PREPARATION OF BISMUTH TITANATE FILMS BY ELECTRON-CYCLOTRON-RESONANCE PLASMA SPUTTERING-CHEMICAL VAPOR-DEPOSITION
    MASUMOTO, H
    HIRAI, T
    JOURNAL DE PHYSIQUE IV, 1995, 5 (C5): : 671 - 677
  • [33] Molybdenum-containing carbon films deposited using the screen grid technique in an electron cyclotron resonance chemical vapor deposition system
    Huang, QF
    Yoon, SF
    Rusli
    Yang, H
    Ahn, J
    Zhang, Q
    DIAMOND AND RELATED MATERIALS, 2000, 9 (3-6) : 534 - 538
  • [34] Effect of carbon sources on silicon carbon nitride films growth in an electron cyclotron resonance plasma chemical vapor deposition reactor
    Wu, JJ
    Chen, KH
    Wen, CY
    Chen, LC
    Guo, XJ
    Lo, HJ
    Lin, ST
    Yu, YC
    Wang, CW
    Lin, EK
    DIAMOND AND RELATED MATERIALS, 2000, 9 (3-6) : 556 - 561
  • [35] Microcrystalline silicon films deposited by electron cyclotron resonance plasma chemical vapor deposition using helium gas
    Lee, KE
    Lee, WH
    Shin, SC
    Lee, CC
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1996, 35 (10A): : L1241 - L1244
  • [36] PREPARATION OF DIAMOND-LIKE CARBON-FILMS BY ELECTRON-CYCLOTRON RESONANCE CHEMICAL VAPOR-DEPOSITION
    NAGAI, I
    ISHITANI, A
    KURODA, H
    YOSHIKAWA, M
    NAGAI, N
    JOURNAL OF APPLIED PHYSICS, 1990, 67 (06) : 2890 - 2893
  • [37] Low temperature synthesis of diamond films with electron cyclotron resonance plasma chemical vapor deposition
    Mantei, TD
    Ring, Z
    Schweizer, M
    Tlali, S
    Jackson, HE
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1996, 35 (4B): : 2516 - 2519
  • [38] Study on α-C:F films deposited by electron cyclotron resonance plasma chemical vapor deposition
    Ye, C
    Ning, ZY
    Cheng, SH
    Kang, J
    ACTA PHYSICA SINICA, 2001, 50 (04) : 784 - 789
  • [39] Mechanical properties of amorphous carbon nitride films synthesized by electron cyclotron resonance microwave plasma chemical vapor deposition
    Chan, WC
    Fung, MK
    Lai, KH
    Bello, I
    Lee, ST
    Lee, CS
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1999, 254 : 180 - 185
  • [40] Wide band gap silicon carbon nitride films deposited by electron cyclotron resonance plasma chemical vapor deposition
    Chen, KH
    Wu, JJ
    Wen, CY
    Chen, LC
    Fan, CW
    Kuo, PF
    Chen, YF
    Huang, YS
    THIN SOLID FILMS, 1999, 355 : 205 - 209
12345