Effects of deposition methods on the properties of silicon nitride and silicon oxynitride films

被引：0

作者：

Hirao, Takashi ^{[1
]}

Kitagawa, Masatoshi ^{[1
]}

Kamada, Takeshi ^{[1
]}

Tsukamoto, Kazuyoshi ^{[1
]}

Yoshioka, Yoshiaki ^{[1
]}

Kuramasu, Keizaburo ^{[1
]}

Korechika, Tetsuhiro ^{[1
]}

Wasa, Kiyotaka ^{[1
]}

机构：

[1] Matsushita Electric Industrial Co, Japan

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1988年 / 27卷 / 09期

关键词：

D O I：

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中图分类号：

学科分类号：

摘要：

引用

页码：1609 / 1615

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