Property change of Si(111) surface by scanning tunneling microscope manipulation

被引：0
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作者：
Heike, Seiji [1 ]
Hashizume, Tomihiro [1 ]
Watanabe, Satoshi [1 ]
Lutwyche, Mark I. [1 ]
Wada, Yasuo [1 ]
机构：
[1] Hitachi Ltd, Saitama, Japan
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 1996年 / 35卷 / 10 B期
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摘要：
14
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