The influence of the magnetron sputtering deposition parameters on optical properties of a-C:H thin films

被引：0
|
作者：
Lazar, G.
机构：
来源：
| 2001年 / Polish Academy of Sciences卷 / 100期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Influence of ion energy flux on structure and optical properties of a-C:H thin films
    Lee, JH
    Lee, YH
    Farouk, B
    JOURNAL OF APPLIED PHYSICS, 1996, 79 (10) : 7676 - 7681
  • [22] The effect of thermal annealing on the structural and mechanical properties of a-C:H thin films prepared by the CFUBM magnetron sputtering method
    Park, Yong Seob
    Hong, Byungyou
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2008, 354 (33) : 3980 - 3983
  • [23] A-C(:H) and a-CNx(:H) films deposited by magnetron sputtering and PACVD
    Nobili, L
    Cavallotti, PL
    Lecis, GC
    De Ponti, G
    Lenardi, C
    THIN SOLID FILMS, 1998, 317 (1-2) : 359 - 362
  • [24] Structure and electrical properties of a-C:H thin films deposited by RF sputtering
    Yamazato, M.
    Mizuma, I.
    Higa, A.
    DIAMOND AND RELATED MATERIALS, 2010, 19 (7-9) : 695 - 698
  • [25] Influence of Deposition Parameters on the Composition and Structure of Reactively Sputtered Nanocomposite TaC/a-C:H Thin Films
    Ryan D. Evans
    Jane Y. Howe
    James Bentley
    Gary L. Doll
    Jeffrey T. Glass
    Journal of Materials Research, 2005, 20 (9) : 2583 - 2596
  • [26] Influence of deposition parameters on the composition and structure of reactively sputtered nanocomposite TaC/a-C:H thin films
    Evans, RD
    Howe, JY
    Bentley, J
    Doll, GL
    Glass, JT
    JOURNAL OF MATERIALS RESEARCH, 2005, 20 (09) : 2583 - 2596
  • [27] The influence of deposition parameters on TiB2 thin films prepared by DC magnetron sputtering
    Grancic, B
    Mikula, M
    Hrubá, L
    Gregor, M
    Stefecka, M
    Csuba, A
    Dobrocka, E
    Plecenik, A
    Kús, P
    VACUUM, 2005, 80 (1-3) : 174 - 177
  • [28] Effect of Ti Incorporation on the Microstructure and Properties of the a-C:H Films Deposited by Magnetron Sputtering Technique
    Wang Yongxia
    Ye Yinping
    Li Hongxuan
    Ji Li
    Wang Yongjun
    Wu Yanxia
    Liu Xiaohong
    Chen Jianmin
    Zhou Huidi
    RARE METAL MATERIALS AND ENGINEERING, 2012, 41 : 366 - 370
  • [29] Effect of Ti Incorporation on the Microstructure and Properties of the a-C:H Films Deposited by Magnetron Sputtering Technique
    Wang YongxiaYe YinpingLi HongxuanJi LiWang YongjunWu YanxiaLiu XiaohongChen Jianmin Zhou Huidi State Key Laboratory of Solid LubricationLanzhou Institute of Chemical PhysicsChinese Academy of SciencesLanzhou China Graduate University of Chinese Academy of SciencesBeijing China
    稀有金属材料与工程, 2012, 41(S1) (S1) : 366 - 370
  • [30] Microstructures and tribological properties of TiC/a-C films grown by magnetron sputtering
    Zhang, Wenyan
    Zhang, Xuhai
    Fang, Feng
    Jiang, Jianqing
    Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology, 2009, 29 (03): : 282 - 286
12345