The influence of the magnetron sputtering deposition parameters on optical properties of a-C:H thin films

被引:0
|
作者
Lazar, G.
机构
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] The influence of the magnetron sputtering deposition parameters on optical properties of a-C:H thin films
    Lazar, G
    ACTA PHYSICA POLONICA A, 2001, 100 (01) : 67 - 74
  • [2] Influence of Deposition Parameters on Silicon Thin Films Deposited by Magnetron Sputtering
    Rajan, Grace
    Miryala, Tejaswini
    Karki, Shankar
    Collins, Robert W.
    Podraza, Nikolas
    Marsillac, Sylvain
    2017 IEEE 44TH PHOTOVOLTAIC SPECIALIST CONFERENCE (PVSC), 2017, : 2646 - 2649
  • [3] Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering
    Jiang, Jinlong
    Wang, Yubao
    Du, Jinfang
    Yang, Hua
    Hao, Junying
    APPLIED SURFACE SCIENCE, 2016, 379 : 516 - 522
  • [4] Growth of a-C:H and a-C:H⟨Cu⟩ films produced by magnetron sputtering
    Zvonareva, TK
    Ivanov-Omskii, VI
    Nashchekin, AV
    Sharonova, LV
    SEMICONDUCTORS, 2000, 34 (01) : 98 - 103
  • [5] Growth of a-C:H and a-C:H〈Cu〉 films produced by magnetron sputtering
    T. K. Zvonareva
    V. I. Ivanov-Omskii
    A. V. Nashchekin
    L. V. Sharonova
    Semiconductors, 2000, 34 : 98 - 103
  • [6] Evaluation of phase, composition, microstructure and properties in TiC/a-C:H thin films deposited by magnetron sputtering
    Gulbinski, W
    Mathur, S
    Shen, H
    Suszko, T
    Gilewicz, A
    Warcholinski, B
    APPLIED SURFACE SCIENCE, 2005, 239 (3-4) : 302 - 310
  • [7] Influence of deposition parameters on the internal stress in a-C:H films
    Cheng, YH
    Wu, YP
    Chen, JG
    Xu, DQ
    Qiao, XL
    Xie, CS
    SURFACE & COATINGS TECHNOLOGY, 1999, 111 (2-3): : 141 - 147
  • [8] Scanning tunneling spectroscopy of a-C:H and a-C:(H, Cu) films prepared by magnetron sputtering
    Zvonareva, TK
    Ivanov-Omskii, VI
    Rozanov, VV
    Sharonova, LV
    SEMICONDUCTORS, 2001, 35 (12) : 1398 - 1403
  • [9] Scanning tunneling spectroscopy of a-C:H and a-C:(H, Cu) films prepared by magnetron sputtering
    T. K. Zvonareva
    V. I. Ivanov-Omskii
    V. V. Rozanov
    L. V. Sharonova
    Semiconductors, 2001, 35 : 1398 - 1403
  • [10] A-C:H films deposition by sputtering/CVD method
    Lazar, G
    ACTA PHYSICA SLOVACA, 2002, 52 (05) : 467 - 473