Measurements of plasma controlled by compressed magnetic field magnetron sputtering technique

被引：0
|
作者：
机构：
[1] Ido, Shunji
[2] Ishida, Yukihiro
[3] Hijikata, Keninchi
来源：
Ido, Shunji | 1600年 / 32期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Simulation and optimization of magnetic field for planar magnetron sputtering target
    Liu, Qirong
    Dong, Guobo
    Gao, Fangyuan
    Xiao, Yu
    Diao, Xungang
    Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology, 2013, 33 (12): : 1223 - 1228
  • [22] INFLUENCE OF MAGNETIC FIELD CONFIGURATION AND STRENGTH ON PLASMA PARAMETERS AND EFFICIENCY OF COATINGS DEPOSITION IN MAGNETRON SPUTTERING SYSTEM
    Chunadra, A. G.
    Sereda, K. N.
    Tarasov, I. K.
    Makhlai, V. A.
    Kozhukhovskyi, B. M.
    PROBLEMS OF ATOMIC SCIENCE AND TECHNOLOGY, 2022, (06): : 103 - 106
  • [23] Magnetron plasma structure with strong magnetic field
    Shidoji, E
    Makabe, T
    THIN SOLID FILMS, 2003, 442 (1-2) : 27 - 31
  • [24] Modified magnetic controlled plasma sputtering method
    Golan, G
    Axelevitch, A
    Rabinovich, E
    VACUUM, 1996, 47 (09) : 1081 - 1083
  • [25] A Plasma Lens for Magnetron Sputtering
    Anders, Andre
    Brown, Jeff
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2011, 39 (11) : 2528 - 2529
  • [26] Magnetic Field Simulation and Structure Design of Cylindrical Magnetron Sputtering Target
    Wang D.
    Cai C.-L.
    Mi Q.
    Wang L.-B.
    Liu H.-C.
    Hou J.
    Surface Technology, 2023, 52 (08): : 371 - 379
  • [27] A　SMALL　UNBALANCED　MAGNETRON　SPUTTERING　SOURCE　WITH　MULTIPOLE　MAGNETIC　FIELD　ANODE
    郑思孝
    孙官清
    廖小东
    Nuclear Science and Techniques, 1994, (02) : 113 - 115
  • [28] The Effects of Magnetic Field on the Deposited Performance of CrN Films by Magnetron Sputtering
    Jean, Ming-Der
    Chou, Ming-Tsong
    ADVANCED MATERIALS AND PROCESSES, PTS 1-3, 2011, 311-313 : 1340 - 1347
  • [29] Magnetic field analysis for magnetron sputtering apparatus for accurate composition control
    Sakurai, Yutaka
    Nakajima, Ryo
    Nakamura, Hiroko
    SMART MATERIALS FOR SMART DEVICES AND STRUCTURES, 2009, 154 : 175 - +
  • [30] The influence of the magnetic field on ion impact on the cathode of a sputtering magnetron discharge
    Li, J
    Chen, QM
    Zhang, W
    Li, ZG
    Pan, JJ
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1996, 29 (06) : 1624 - 1631
12345