Measurements of plasma controlled by compressed magnetic field magnetron sputtering technique

被引：0
|
作者：
机构：
[1] Ido, Shunji
[2] Ishida, Yukihiro
[3] Hijikata, Keninchi
来源：
Ido, Shunji | 1600年 / 32期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] MEASUREMENTS OF PLASMA CONTROLLED BY COMPRESSED MAGNETIC-FIELD MAGNETRON SPUTTERING TECHNIQUE
    IDO, S
    ISHIDA, Y
    HIJIKATA, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (5A): : 2112 - 2115
  • [2] Plasma diagnostics of magnetic field assisted ionized magnetron sputtering
    Joo, J
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1999, 17 (04): : 2368 - 2373
  • [3] Influence of additional magnetic field on plasma parameters in magnetron sputtering
    Yang, P.
    Ren, C. S.
    Wang, D. Z.
    Qi, X. L.
    Guo, S. H.
    Ma, T. C.
    VACUUM, 2009, 83 (11) : 1376 - 1381
  • [4] NEW METHOD TO CONTROL COMPOSITION RATIO OF ALLOY-FILMS BY COMPRESSED MAGNETIC-FIELD MAGNETRON SPUTTERING TECHNIQUE
    HATA, T
    KAMIDE, Y
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04): : 2154 - 2158
  • [5] Analysis of Magnetic Field and Discharge Plasma for HTS Magnetron Sputtering Apparatus
    Qiu, Qingquan
    Xiao, Liye
    Huang, Tianbin
    Zhang, Guomin
    Li, Xiaohang
    IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY, 2010, 20 (03) : 1017 - 1020
  • [6] Spatial Distribution of a High-Power Impulse Magnetron Sputtering Glow Plasma by a Controlled Unbalanced Magnetic Field
    Konishi, Takumi
    Takaki, Koichi
    Yukimura, Ken
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2014, 42 (10) : 2786 - 2787
  • [7] CHARACTERISTICS OF A-Si FILMS PREPARED BY COMPRESSED MAGNETIC FIELD (CMF)-MAGNETRON SPUTTERING.
    Hata, Tomonobu
    Kamide, Yukihiro
    Nakagawa, Shigeki
    Hattori, Kouji
    Electronics and Communications in Japan, Part II: Electronics (English translation of Denshi Tsushin Gakkai Ronbunshi), 1988, 71 (02): : 9 - 18
  • [8] Balanced magnetic field in magnetron sputtering systems
    Golosov, Dmitriy A.
    VACUUM, 2017, 139 : 109 - 116
  • [9] FABRICATION OF SUPERLATTICE STRUCTURES BY PLASMA CONTROLLED MAGNETRON SPUTTERING
    HATA, T
    KAMIYA, K
    KAMIDE, Y
    HORITA, S
    THIN SOLID FILMS, 1988, 163 : 467 - 473
  • [10] Experimental Study of the Effect of Applied Magnetic Field on Plasma Properties of Unbalanced Magnetron Sputtering
    牟宗信
    王春
    牟晓东
    贾莉
    刘升光
    董闯
    Plasma Science and Technology, 2010, 12 (05) : 571 - 576
12345