Simulation of plasma-based ion implantation of a sawtooth target

被引:0
|
作者
Sheridan, T.E. [1 ]
机构
[1] West Virginia Univ, Morgantown, United States
来源
Surface and Coatings Technology | 1997年 / 93卷 / 2-3期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:225 / 228
相关论文
共 50 条
  • [1] Simulation of plasma-based ion implantation of a sawtooth target
    Sheridan, TE
    SURFACE & COATINGS TECHNOLOGY, 1997, 93 (2-3): : 225 - 228
  • [2] Plasma-based ion implantation
    Möller, W
    Mukherjee, S
    CURRENT SCIENCE, 2002, 83 (03): : 237 - 253
  • [3] Two-dimensional simulation of plasma-based ion implantation
    Paulus, M
    Stals, L
    Rüde, U
    Rauschenbach, B
    JOURNAL OF APPLIED PHYSICS, 1999, 85 (02) : 761 - 766
  • [4] Multi-dipolar plasmas for plasma-based ion implantation and plasma-based ion implantation and deposition
    Béchu, S
    Maulat, O
    Arnal, Y
    Vempaire, D
    Lacoste, A
    Pelletier, J
    SURFACE & COATINGS TECHNOLOGY, 2004, 186 (1-2): : 170 - 176
  • [5] Effect of target size on dose uniformity in plasma-based ion implantation
    Sheridan, TE
    JOURNAL OF APPLIED PHYSICS, 1997, 81 (11) : 7153 - 7157
  • [6] TiN deposition and ion current distribution for trench target by plasma-based ion implantation and deposition
    Yukimura, K
    Ma, XX
    Ikehata, T
    SURFACE & COATINGS TECHNOLOGY, 2005, 193 (1-3): : 17 - 21
  • [7] Plasma-based ion implantation utilising a cathodic arc plasma
    Bilek, MMM
    McKenzie, DR
    Tarrant, RN
    Lim, SHM
    McCulloch, DG
    SURFACE & COATINGS TECHNOLOGY, 2002, 156 (1-3): : 136 - 142
  • [8] Effects of target voltage on the structure of the film prepared by plasma-based ion implantation and deposition method
    Yukimura, K
    Kuze, E
    Kumagai, M
    Maruyama, T
    Kohata, M
    Numata, K
    Saito, H
    Ma, XX
    SURFACE & COATINGS TECHNOLOGY, 2003, 169 : 472 - 474
  • [9] Plasma-based ion implantation sterilization technique and ion energy estimation
    Tanaka, T
    Watanabe, S
    Shibahara, K
    Yokoyama, S
    Takagi, T
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2005, 23 (04): : 1018 - 1021
  • [10] A pulsed inductively coupled plasma source for plasma-based ion implantation
    Tuszewski, M
    Scheuer, JT
    Adler, RA
    SURFACE & COATINGS TECHNOLOGY, 1997, 93 (2-3): : 203 - 208