Modeling of agglomeration in polycrystalline thin films. Application to TiSi2 on a silicon substrate

被引：0
|
作者：
机构：
来源：
| 1600年 / 71期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] TISI2 POLYCRYSTALLINE SILICON - ARSENIC DISTRIBUTION AND SI GRAIN-GROWTH
    ZHENG, LR
    HUNG, LS
    PHILLIPS, JR
    MAYER, JW
    JOURNAL OF APPLIED PHYSICS, 1987, 62 (11) : 4426 - 4432
  • [22] Low resistivity TiSi2 on narrow p+ polycrystalline silicon lines
    Herner, SB
    Vyvoda, MA
    APPLIED PHYSICS LETTERS, 2002, 81 (02) : 259 - 261
  • [23] INTERACTION OF TISI2 LAYERS WITH POLYCRYSTALLINE SI
    ZHENG, LR
    HUNG, LS
    FENG, SQ
    REVESZ, P
    MAYER, JW
    MILES, G
    APPLIED PHYSICS LETTERS, 1986, 48 (12) : 767 - 769
  • [24] THERMAL-STABILITY AND INTERFACE BOWING OF SUBMICRON TISI2/POLYCRYSTALLINE SILICON
    NORSTROM, H
    MAEX, K
    VANDENABEELE, P
    THIN SOLID FILMS, 1991, 198 (1-2) : 53 - 66
  • [25] RESISTIVITY AND MORPHOLOGY OF TISI2 FORMED ON XE+-IMPLANTED POLYCRYSTALLINE SILICON
    KUWANO, H
    PHILLIPS, JR
    MAYER, JW
    APPLIED PHYSICS LETTERS, 1990, 56 (05) : 440 - 442
  • [26] Nitridation of TiSi2 thin films by rapid thermal processing
    PerezRigueiro, J
    Jimenez, C
    Vazquez, L
    PerezCasero, R
    MartinezDuart, JM
    SURFACE & COATINGS TECHNOLOGY, 1996, 80 (1-2): : 72 - 75
  • [27] ON THE EPITAXIAL RELATIONSHIPS OF TISI2 ON SILICON
    NIPOTI, R
    ARMIGLIATO, A
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1985, 24 (11): : 1421 - 1424
  • [28] Adjusting poly texture to reduce TiSi2 agglomeration
    Zhang, JY
    Pan, Q
    2004 IEEE WORKSHOP ON MICROELECTRONIC AND ELECTRON DEVICES, 2004, : 93 - 94
  • [29] Polycrystalline silicon thin films on glass substrate
    Dimova-Malinovska, D
    Angelov, O
    Sendova-Vassileva, M
    Kamenova, M
    Pivin, JC
    THIN SOLID FILMS, 2004, 451 : 303 - 307
  • [30] Retarded C54 transformation and suppressed agglomeration by precipitates in TiSi2 films
    Suh, YS
    Park, DG
    Jang, SA
    Lee, SH
    Kim, TK
    Yeo, IS
    Kim, SD
    Kim, CT
    JOURNAL OF APPLIED PHYSICS, 2000, 87 (06) : 2760 - 2764
12345