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- [1] AL ETCHING CHARACTERISTICS EMPLOYING HELICON WAVE PLASMA JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (6B): : 3019 - 3022
- [3] Etching characteristics in helicon wave plasma PLASMA SOURCES SCIENCE & TECHNOLOGY, 1993, 2 (01): : 11 - 13
- [4] Etching characteristics by M = 0 helicon wave plasma Tsukada, Tsutomu, 1600, JJAP, Minato-ku, Japan (33):
- [6] ETCHING CHARACTERISTICS BY M=0 HELICON WAVE PLASMA JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (7B): : 4433 - 4437
- [9] Damage formed on silicon surface by helicon wave plasma etching Japanese Journal of Applied Physics, Part 2: Letters, 1993, 32 (4 A):