Epitaxial AlN thin films grown on α-Al2O3 substrates by ECR dual ion beam sputtering

被引：0
|
作者：
Okano, Hiroshi [1 ]
Tanaka, Naoki [1 ]
Kobayashi, Masami [1 ]
Usuki, Tatsuro [1 ]
Shibata, Kenichi [1 ]
机构：
[1] Sanyo Electric Co, Ltd, Osaka, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1995年 / 34卷 / 9 B期
关键词：
Piezoelectric materials;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：5172 / 5177
相关论文
共 50 条
  • [1] EPITAXIAL ALN THIN-FILMS GROWN ON ALPHA-AL2O3 SUBSTRATES BY ECR DUAL-ION BEAM SPUTTERING
    OKANO, H
    TANAKA, N
    KOBAYASHI, M
    USUKI, T
    SHIBATA, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (9B): : 5172 - 5177
  • [2] Ion-Beam Deposition of Thin AlN Films on Al2O3 Substrate
    Lunin, L. S.
    Devitskii, O. V.
    Sysoev, I. A.
    Pashchenko, A. S.
    Kas'yanov, I. V.
    Nikulin, D. A.
    Irkha, V. A.
    TECHNICAL PHYSICS LETTERS, 2019, 45 (12) : 1237 - 1240
  • [3] Ion-Beam Deposition of Thin AlN Films on Al2O3 Substrate
    L. S. Lunin
    O. V. Devitskii
    I. A. Sysoev
    A. S. Pashchenko
    I. V. Kas’yanov
    D. A. Nikulin
    V. A. Irkha
    Technical Physics Letters, 2019, 45 : 1237 - 1240
  • [4] Epitaxial growth of aluminum nitride thin films on (111)Si by ECR dual ion beam sputtering
    Usuki, T
    Tanaka, N
    Kobayashi, Y
    Okano, H
    Shibata, K
    INTEGRATED FERROELECTRICS, 1998, 20 (1-4) : 251 - 253
  • [5] Epitaxial growth and characterization of Cu thin films deposited on Al2O3(0001) substrates by magnetron sputtering
    Lee, Ik-Jae
    Kim, Hee Seob
    Yun, Young Duck
    Kang, Seen-Woong
    Kim, Hyo-Yun
    Kwon, Hyuk Chae
    Kim, Jin Woo
    Joo, Mankil
    Kim, Younghak
    MATERIALS LETTERS, 2021, 299
  • [6] ICEMS Characterization of NixFe3-xO4 (0.7 ≤ x ≤ 1.7) thin films grown by ion beam sputtering on (0001) Al2O3 substrates
    Prieto P.
    Prieto J.E.
    Serrano A.
    Soriano L.
    de la Figuera J.
    Marco J.F.
    Interactions, 2024, 245 (01)
  • [7] Synthesis of epitaxial γAl2O3 thin films by thermal oxidation of AlN/sapphire(0001) thin films
    H.C. Kang
    S.H. Seo
    H.W. Jang
    D.H. Kim
    J.W. Kim
    D.Y. Noh
    Applied Physics A, 2003, 77 : 627 - 632
  • [8] Synthesis of epitaxial γ-Al2O3 thin films by thermal oxidation of AlN/sapphire(0001) thin films
    Kang, HC
    Seo, SH
    Jang, HW
    Kim, DH
    Kim, JW
    Noh, DY
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2003, 77 (05): : 627 - 632
  • [9] Low temperature epitaxial growth of AlN thin films on Al2O3(0001) by reactive dc faced magnetron sputtering
    Kim, JW
    Kim, HK
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 1998, 32 : S1664 - S1666
  • [10] Optical Properties of Amorphous AlN Thin Films on Glass and Silicon Substrates Grown by Single Ion Beam Sputtering
    Hajakbari, Fatemeh
    Larijani, Majid Mojtahedzadeh
    Ghoranneviss, Mahmood
    Aslaninejad, Morteza
    Hojabri, Alireza
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (09)
12345