Electrical properties of reactively sputtered CNx films

被引：1
|
作者：
Monclus, M.A. [1 ]
Cameron, D.C. [2 ]
Chowdhurry, A.K.M.S. [1 ]
机构：
[1] Materials Processing Research Centre, Dublin City University, 9, Dublin, Ireland
[2] School of Electronic Engineering, Dublin City University, 9, Dublin, Ireland
来源：
Thin Solid Films | 1999年 / 341卷 / 01期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：94 / 100
相关论文
共 50 条
  • [1] Electrical properties of reactively sputtered CNx films
    Monclus, MA
    Cameron, DC
    Chowdhurry, AKMS
    THIN SOLID FILMS, 1999, 341 (1-2) : 94 - 100
  • [2] Electrical properties of reactively sputtered carbon nitride films
    Wei, J
    Hing, P
    THIN SOLID FILMS, 2002, 410 (1-2) : 21 - 27
  • [3] Electrical properties of reactively sputtered carbon nitride films
    Monclus, MA
    Cameron, DC
    Barklie, R
    Collins, M
    SURFACE & COATINGS TECHNOLOGY, 1999, 116 : 54 - 58
  • [4] Growth and electrical properties of reactively sputtered WSx thin films
    Regula, M
    Ballif, C
    Levy, F
    POLYCRYSTALLINE SEMICONDUCTORS IV - PHYSICS, CHEMISTRY AND TECHNOLOGY, 1996, 51-5 : 335 - 340
  • [5] Structural, optical and electrical properties of reactively sputtered iron oxynitride films
    Petitjean, C.
    Grafoute, M.
    Pierson, J. F.
    Rousselot, C.
    Banakh, O.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2006, 39 (09) : 1894 - 1898
  • [6] Electrical properties of reactively-sputtered hydrogenated carbon nitride films
    Wei, J.
    INTERNATIONAL JOURNAL OF NANOSCIENCE, VOL 3, NOS 4 AND 5, 2004, 3 (4-5): : 555 - 562
  • [7] PROPERTIES OF REACTIVELY SPUTTERED SUPERCONDUCTING FILMS
    GAVALER, JR
    IEEE TRANSACTIONS ON MAGNETICS, 1979, 15 (01) : 623 - 624
  • [8] PROPERTIES OF REACTIVELY SPUTTERED NBN FILMS
    WESTRA, KL
    BRETT, MJ
    VANELDIK, JF
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03): : 1288 - 1293
  • [9] Controlling the Electrical Properties of Reactively Sputtered High Entropy Alloy CrFeNiCoCu Films
    Mayandi, J.
    Finstad, T. G.
    Stange, M.
    Vasque, G. C.
    Sunding, M. F.
    Lovvik, O. M.
    Diplas, S.
    Carvalho, P. A.
    JOURNAL OF ELECTRONIC MATERIALS, 2022, 51 (02) : 803 - 812
  • [10] Controlling the Electrical Properties of Reactively Sputtered High Entropy Alloy CrFeNiCoCu Films
    J. Mayandi
    T. G. Finstad
    M. Stange
    G. C. Vásque
    M. F. Sunding
    O. M. Løvvik
    S. Diplas
    P. A. Carvalho
    Journal of Electronic Materials, 2022, 51 : 803 - 812
12345