Hardness and stiffness of amorphous SiCxNy chemical vapor deposited coatings

被引:0
|
作者
Bendeddouche, Abderrahim [1 ]
Berjoan, René [2 ]
Bêche, Eric [2 ]
Hillel, Roger [1 ]
机构
[1] IMP-CNRS, Université de Perpignan, 66860 Perpignan cedex, France
[2] IMP-CNRS, BP 5 Odeillo, 66120 Font-Romeu, France
来源
Surface and Coatings Technology | 1999年 / 111卷 / 2-3期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:184 / 190
相关论文
共 50 条
  • [21] Compositionally graded mullite-based chemical vapor deposited coatings
    Kulkarni, Tushar
    Wang, H. Z.
    Basu, S. N.
    Sarin, V. K.
    JOURNAL OF MATERIALS RESEARCH, 2009, 24 (02) : 470 - 474
  • [22] Compositionally graded mullite-based chemical vapor deposited coatings
    Tushar Kulkarni
    H.Z. Wang
    S.N. Basu
    V.K. Sarin
    Journal of Materials Research, 2009, 24 : 470 - 474
  • [23] THERMAL AGING OF COMBUSTION CHEMICAL-VAPOR-DEPOSITED OXIDE COATINGS
    CARTER, WB
    HAMPIKIAN, JM
    GODFREY, SH
    POLLEY, TA
    MATERIALS AND MANUFACTURING PROCESSES, 1995, 10 (05) : 1007 - 1020
  • [24] Effect of rf bias (ion current density) on the hardness of amorphous silicon oxide films deposited by plasma enhanced chemical vapor deposition
    Jin, Su B.
    Choi, Yoon S.
    Kim, Youn J.
    Choi, In S.
    Han, Jeon G.
    SURFACE & COATINGS TECHNOLOGY, 2010, 205 : S139 - S143
  • [25] A comparative study of the mechanical strength of chemical vapor-deposited diamond and physical vapor-deposited hard coatings
    Kamiya, S
    Nagasawa, H
    Yamanobe, K
    Saka, M
    THIN SOLID FILMS, 2005, 473 (01) : 123 - 131
  • [26] Moisture barrier properties of plasma enhanced chemical vapor deposited SiCxNy films on polyethylene naphthalate sheets and epoxy molding compound
    Kaltenpoth, G
    Siebert, W
    Stubhan, F
    Wang, XH
    Luo, L
    SURFACE & COATINGS TECHNOLOGY, 2002, 161 (01): : 96 - 101
  • [27] AMORPHOUS TO POLYCRYSTAL TRANSITION IN ION IRRADIATED CHEMICAL VAPOR-DEPOSITED AMORPHOUS-SILICON
    SPINELLA, C
    LOMBARDO, S
    CAMPISANO, SU
    APPLIED SURFACE SCIENCE, 1989, 43 : 187 - 190
  • [28] CHEMICAL VAPOR-DEPOSITED SILICON-NITRIDE .4. HARDNESS CHARACTERISTICS
    NIIHARA, K
    HIRAI, T
    JOURNAL OF MATERIALS SCIENCE, 1977, 12 (06) : 1243 - 1252
  • [29] Enhanced Wettability, Hardness, and Tunable Optical Properties of SiCxNy Coatings Formed by Reactive Magnetron Sputtering
    Sulyaeva, Veronica S.
    Kolodin, Alexey N.
    Khomyakov, Maxim N.
    Kozhevnikov, Alexander K.
    Kosinova, Marina L.
    MATERIALS, 2023, 16 (04)
  • [30] Atomic arrangement and mechanical properties of chemical-vapor-deposited amorphous boron
    Maita, Jessica M.
    Song, Gyuho
    Colby, Mariel
    Lee, Seok-Woo
    MATERIALS & DESIGN, 2020, 193 (193)