Study on the mechanisms of chemical mechanical polishing on copper and aluminum surfaces employing in situ infrared spectroscopy

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[1] Ogawa, Hiroki
[2] Tokuyama, Yusuke
[3] Yanagisawa, Michihiko
[4] Nakagawa, Hideo
[5] Kikuchi, Jun
[6] Horiike, Yasuhiro
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Ogawa, H. (ogawa@micro.mm.t.u-tokyo.ac.jp) | 1600年 / Japan Society of Applied Physics卷 / 42期
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