Analytical studies of nickel silicide formation through a thin Ti layer

被引：0
|
作者：
Fenske, F. [1 ]
Schopke, A. [1 ]
Schulze, S. [1 ]
Selle, B. [1 ]
机构：
[1] Hahn-Meitner-Inst Berlin, Berlin, Germany
来源：
Applied Surface Science | 1996年 / 104-105卷
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摘要：
26
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页码：218 / 222
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