Hydrogen depth profiling with sub-nm resolution in high-resolution ERD

被引：0
|
作者：
Kyoto Univ, Kyoto, Japan [1 ]
机构：
来源：
Nucl Instrum Methods Phys Res Sect B | / 3-4卷 / 397-401期
关键词：
Number:; -; Acronym:; MEXT; Sponsor: Ministry of Education; Culture; Sports; Science and Technology;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Hydrogen depth profiling with sub-nm resolution in high-resolution ERD
    Kimura, K
    Nakajima, K
    Imura, H
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1998, 140 (3-4): : 397 - 401
  • [2] Semiconductor profiling with sub-nm resolution: Challenges and solutions
    Vandervorst, W.
    APPLIED SURFACE SCIENCE, 2008, 255 (04) : 805 - 812
  • [3] Depth profiling of magnetic and atomic structures of ultrathin films by depth-resolved XMCD and XAFS techniques with a sub-nm depth resolution
    Amemiya, K.
    Miyawaki, J.
    Abe, H.
    Sako, E. O.
    Sakamaki, M.
    14TH INTERNATIONAL CONFERENCE ON X-RAY ABSORPTION FINE STRUCTURE (XAFS14), PROCEEDINGS, 2009, 190
  • [4] "Inside-out" approach for sub-nm resolution carrier profiling in semiconductors
    Hagmann, Mark J.
    2016 IEEE WORKSHOP ON MICROELECTRONICS AND ELECTRON DEVICES (WMED), 2016, : 10 - 13
  • [5] HIGH-RESOLUTION COMPOSITIONAL DEPTH PROFILING
    HOFMANN, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (03): : 1466 - 1476
  • [6] Sub-nm resolution cavity enhanced microspectrometer
    Kyotoku, Bernardo B. C.
    Chen, Long
    Lipson, Michal
    OPTICS EXPRESS, 2010, 18 (01): : 102 - 107
  • [7] High-resolution Auger depth profiling by sub-keV ion sputtering
    Inoue, M
    Shimizu, R
    Lee, HI
    Kang, HJ
    SURFACE AND INTERFACE ANALYSIS, 2005, 37 (02) : 167 - 170
  • [8] APPROACHING THE LIMITS OF HIGH-RESOLUTION DEPTH PROFILING
    HOFMANN, S
    APPLIED SURFACE SCIENCE, 1993, 70-1 : 9 - 19
  • [9] Sub-nm resolution depth profiling of the magnetic structure of thin films by the depth-resolved x-ray magnetic circular dichroism technique
    Amemiya, K.
    Sakamaki, M.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2011, 44 (06)
  • [10] High-resolution depth profiling of ultrashallow boron implants in silicon using high-resolution RBS
    Kimura, K
    Oota, Y
    Nakajima, K
    Büyüklimanli, TH
    CURRENT APPLIED PHYSICS, 2003, 3 (01) : 9 - 11
12345