AFM analysis on TiO2 low-E thin films deposited by magnetron sputtering

被引：0
|
作者：
Zheng, Zi-Yao
Wang, Zhu
Li, Chun-Ling
Zhao, Qing-Nan
机构：
[1] Dept. of Physics, Wuhan University, Wuhan 430072, China
[2] Wuhan University of Technology, Wuhan 430072, China
来源：
Bandaoti Guangdian/Semiconductor Optoelectronics | 2005年 / 26卷 / 05期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：418 / 420
相关论文
共 50 条
  • [31] The oxygen-deficient TiO2 films deposited by a dual magnetron sputtering
    Sidelev, Dmitrii V.
    Yurjev, Yury N.
    Krivobokov, Valeriy P.
    Erofeev, Evgenii V.
    Penkova, Olga V.
    Novikov, Vadim A.
    VACUUM, 2016, 134 : 29 - 32
  • [32] NANOSTRUCTURE OF TiO2 THIN FILMS PREPARED BY UNBALANCED MAGNETRON SPUTTERING
    Pokaipisit, Artorn
    Chaiyakun, Surasing
    Limsuwan, Pichet
    Ngotawornchai, Boonlaer
    INTERNATIONAL JOURNAL OF MODERN PHYSICS B, 2009, 23 (10): : 2395 - 2403
  • [33] The photocatalytic properties of amorphous TiO2 composite films deposited by magnetron sputtering
    Jiamu Huang
    Yuanyuan Liu
    Lingfeng Lu
    Lu Li
    Research on Chemical Intermediates, 2012, 38 : 487 - 498
  • [34] Photocatalytic property of TiO2 films deposited by pulsed DC magnetron sputtering
    Zhang, WJ
    Zhu, SL
    Li, Y
    Wang, FH
    JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY, 2004, 20 (01) : 31 - 34
  • [35] Photocatalytic Property of TiO2 Films Deposited by Pulsed DC Magnetron Sputtering
    Wenjie ZHANG
    Journal of Materials Science & Technology, 2004, (01) : 31 - 34
  • [36] The photocatalytic properties of amorphous TiO2 composite films deposited by magnetron sputtering
    Huang, Jiamu
    Liu, Yuanyuan
    Lu, Lingfeng
    Li, Lu
    RESEARCH ON CHEMICAL INTERMEDIATES, 2012, 38 (02) : 487 - 498
  • [37] Characterization thin films TiO2 obtained in the magnetron sputtering process
    Kaminski, Maciej
    Firek, Piotr
    Caban, Piotr
    ELECTRON TECHNOLOGY CONFERENCE 2016, 2016, 10175
  • [38] Effect of annealing treatment on the photocatalytic activity of TiO2 thin films deposited by dc reactive magnetron sputtering
    Franco Arias, L. M.
    Arias Duran, A.
    Cardona, D.
    Camps, E.
    Gomez, M. E.
    Zambrano, G.
    WORKSHOP ON OXIDE MATERIALS 2014: NOVEL MULTIFUNCTIONAL PROPERTIES, 2015, 614
  • [39] Photo-induced catalytic characteristics of TiO2 thin films deposited by DC reactive magnetron sputtering
    Dong, Hao
    Zhang, Yongxi
    Yang, Xiliang
    Shen, Jie
    Chen, Huaxian
    Jiang, Yiming
    Gu, Yuanzhuang
    Zhang, Zhuangjian
    Zhenkong Kexue yu Jishu Xuebao/Vacuum Science and Technology, 2000, 20 (04): : 252 - 255
  • [40] Investigation of microstructure evolution in Pt-doped TiO2 thin films deposited by rf magnetron sputtering
    Xu Wenbin
    Dong Shurong
    Wang Demiao
    Ren Gaochao
    PHYSICA B-CONDENSED MATTER, 2008, 403 (17) : 2698 - 2701
12345