AFM analysis on TiO2 low-E thin films deposited by magnetron sputtering

被引：0
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作者：
Zheng, Zi-Yao
Wang, Zhu
Li, Chun-Ling
Zhao, Qing-Nan
机构：
[1] Dept. of Physics, Wuhan University, Wuhan 430072, China
[2] Wuhan University of Technology, Wuhan 430072, China
来源：
Bandaoti Guangdian/Semiconductor Optoelectronics | 2005年 / 26卷 / 05期
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页码：418 / 420
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