COSMIC RAY EFFECTS IN MICROELECTRONICS.

被引：0

作者：

Adams, L. ^{[1
]}

机构：

[1] European Space & Technology, Research Cent, Noordwijk, Neth, European Space & Technology Research Cent, Noordwijk, Neth

来源：

Microelectronics Journal | 1985年 / 16卷 / 02期

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

LOGIC CIRCUITS

引用

页码：17 / 29

共 50 条

[31] Award address: Applied polymer science and microelectronics.
Willson, CG
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2004, 227 : U523 - U523
[32] OPTICAL PRODUCTION OF LARGE AREA PATTERNS FOR MICROELECTRONICS.
Milne, A.D.
Stevenson, J.T.M.
Mackie, R.D.L.
Nuclear Instruments and Methods, 1980, : 97 - 110
[33] Welding Aspects of Using Aluminum for Wirings in Microelectronics.
Scheel, Wolfgang
Schmidt, Gunter
Thiede, Marina
Schweisstechnik Berlin, 1983, 33 (12): : 573 - 576
[34] MATERIALS AND APPLICATIONS FOR THIN FILMS IN HYBRID MICROELECTRONICS.
Zinsmeister, G.
Electrocomponent Science and Technology, 1979, 6 (3-4): : 209 - 214
[35] APPROACHING CRISIS IN HIGHLY TRAINED MANPOWER FOR MICROELECTRONICS.
Leon, B.J.
Electric Power Research Institute, Coal Combustion Systems Division, (Report) EPRI CS, 1981, : 10 - 4
[36] Laser-controlled moving atomic structures for microelectronics.
Sovetov, NM
Nikonov, AV
Naumova, EV
Moskovsky, VA
Grigoriev, DA
LASER APPLICATIONS IN MICROELECTRONIC AND OPTOELECTRONIC MANUFACTURING II, 1997, 2991 : 274 - 284
[37] DESIGNER'S GUIDE TO RECHARGEABLE BATTERY POWER FOR MICROELECTRONICS.
Wentink, Robert F.
Wescon Technical Papers, 1979, 23
[38] Dry processing in microelectronics. Towards low pressure plasma technology
Pichot, M.
Vacuum, 1990, 41 (4 -6 Pt2) : 895 - 898
[39] Alternative gate dielectrics for silicon-based microelectronics.
Garfunkel, E
Schulte, H
Busch, B
Sayan, S
Gustafsson, T
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2000, 219 : U560 - U560
[40] Error Compensated Pressure Sensors for Easy Interfacing to Microelectronics.
Kowalski, G.
TM. Technisches Messen, 1986, 53 (06) : 236 - 241

← 1 2 3 4 5 →