Effects of ion beam mixing on the depth profiles of thin metal layer in TiO2

被引:0
|
作者
Natl Industrial Research Inst of, Nagoya, Nagoya, Japan [1 ]
机构
来源
关键词
Ion beams - Ion bombardment - Light absorption - Metallic films - Metallic superlattices - Mixing - Rutherford backscattering spectroscopy - Sol-gels - Thin films - X ray diffraction analysis - X ray photoelectron spectroscopy;
D O I
暂无
中图分类号
学科分类号
摘要
Thin films of TiO2 prepared by a sol-gel method were irradiated with 100 keV Ar ions. A bilayer (Mo/TiO2) and multilayers (TiO2/Mo,Cr,Ag/TiO2) of the thin metal films and TiO2 were used. After the irradiation, concentration profiles and the structure of the surface layer were studied by Rutherford backscattering spectroscopy (RBS), X-ray photoelectron spectroscopy (XPS) and glancing angle X-ray diffraction (G-XRD). It was found that a ballistic mixing was predominant in the redistribution of Mo and Cr atoms embedded in TiO2, and oxides of Mo and Cr were decomposed in metallic states with increasing ion fluence. In the case of TiO2/Ag/TiO2, Ag colloids were formed in process of a dip-coating of the sol-gel method, and the Ag atoms were dispersed into deeper layer by a grain boundary diffusion. Ion beam mixing in the TiO2 films produced a slight increase in the optical absorption of visible light.
引用
收藏
相关论文
共 50 条
  • [31] Optical properties of TiO2 thin films deposited on polycarbonate by ion beam assisted evaporation
    Lin, Su-Shia
    Hung, Yuan-Hsun
    Chen, Shin-Chi
    THIN SOLID FILMS, 2009, 517 (16) : 4621 - 4625
  • [32] Effects of Metal Ion Dopants on Absorption Spectra and Photoreactivity of TiO2 Nanoparticles
    Chen, Jianhua
    Yao, Maosheng
    Wang, Xiaolin
    Feng, Juanjuan
    FUNDAMENTAL OF CHEMICAL ENGINEERING, PTS 1-3, 2011, 233-235 : 2722 - +
  • [33] Layer by layer TiO2 thin films and photodegradation of Congo red
    Sansiviero, Maria T. C.
    dos Santos, David S.
    Job, Aldo E.
    Aroca, Ricardo F.
    JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY, 2011, 220 (01) : 20 - 24
  • [34] Application of ion beam techniques for preparation of metal ion-implanted TiO2 thin film photocatalyst available under visible light irradiation:: Metal ion-implantation and ionized cluster beam method
    Yamashita, H
    Harada, M
    Misaka, J
    Takeuchi, M
    Ichihashi, Y
    Goto, F
    Ishida, M
    Sasaki, T
    Anpo, M
    JOURNAL OF SYNCHROTRON RADIATION, 2001, 8 (02): : 569 - 571
  • [35] Growth of rutile TiO2 nanorods on TiO2 seed layer deposited by electron beam evaporation
    Tamilselvan, V.
    Yuvaraj, D.
    Kumar, R. Rakesh
    Rao, K. Narasimha
    APPLIED SURFACE SCIENCE, 2012, 258 (10) : 4283 - 4287
  • [36] Quantum size effects in TiO2 thin films grown by atomic layer deposition
    Tallarida, Massimo
    Das, Chittaranjan
    Schmeisser, Dieter
    BEILSTEIN JOURNAL OF NANOTECHNOLOGY, 2014, 5 : 77 - 82
  • [37] Role of metal layer in improving the UV-photodetector performance of TiO2/Metal/TiO2/Si structure
    Ferhati, H.
    Djeffal, F.
    Arar, D.
    Dibi, Z.
    JOURNAL OF LUMINESCENCE, 2017, 191 : 117 - 121
  • [38] Composition depth profiles of superconducting MgB2 thin films determined by ion beam analysis methods
    Jergel, M
    Andrade, E
    Chromik, S
    Jergel, M
    Falcony, C
    Strbík, V
    Rocha, MF
    Zavala, EP
    PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS, 2003, 383 (04): : 287 - 294
  • [39] Influence of a TiO2 buffer layer on the magnetic properties of anatase Co:TiO2 thin films
    Gabor, M. S.
    Petrisor, T., Jr.
    Tiusan, C.
    Hehn, M.
    Vasile, B. S.
    Petrisor, T.
    JOURNAL OF APPLIED PHYSICS, 2012, 111 (08)
  • [40] ANALYTIC CORRECTION OF EDGE EFFECTS IN ION-BEAM SPUTTERED DEPTH PROFILES
    HOFFMAN, DW
    TSONG, IST
    POWER, GL
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (02): : 613 - 620