Deposition of tungsten by plasma enhanced chemical vapour deposition

被引：0
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作者：
Bain, M.F. [1 ]
Armstrong, B.M. [1 ]
Gamble, H.S. [1 ]
机构：
[1] N. Ireland Semiconduct. Res. Centre, Dept. of Elec. and Electron. Eng., Queen's University of Belfast, Belfast BT7 1NN, United Kingdom
来源：
Journal De Physique. IV : JP | 1999年 / 9 pt 2卷 / 08期
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页码：8 / 827
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