Studies of the plasma-enhanced chemical vapour deposition of tungsten on silicon and silicon dioxide substrates

被引：0
|
作者：
Wood, J. [1 ]
Hodson, C.M.T. [1 ]
机构：
[1] Univ of York, United Kingdom
来源：
Chemtronics | 1987年 / 2卷 / 04期
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摘要：
11
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页码：172 / 174
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