Sub-10 nm imprint lithography and applications

被引：0
|
作者：
Chou, Stephen Y.
Krauss, Peter R.
Zhang, Wei
Guo, Lingjie
Zhuang, Lei
机构：
来源：
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena | 1997年 / 15卷 / 06期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [31] CMOS Scaling for sub-90 nm to sub-10 nm
    Iwai, H
    17TH INTERNATIONAL CONFERENCE ON VLSI DESIGN, PROCEEDINGS: DESIGN METHODOLOGIES FOR THE GIGASCALE ERA, 2004, : 30 - 35
  • [32] SUB-10 NM LITHOGRAPHY AND DEVELOPMENT PROPERTIES OF INORGANIC RESIST BY SCANNING ELECTRON-BEAM
    FUJITA, J
    WATANABE, H
    OCHIAI, Y
    MANAKO, S
    TSAI, JS
    MATSUI, S
    APPLIED PHYSICS LETTERS, 1995, 66 (22) : 3065 - 3067
  • [33] Sub-10 nm silicon FinFET devices on SOI substrate made by block copolymer lithography
    Li, Dong-Xue
    Chien, Chien-Liang
    Wei, Xinnian
    Huang, Yanwei
    Qu, Xin-Ping
    Chang, Tzu-Hsuan
    Xiong, Shisheng
    2018 14TH IEEE INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUIT TECHNOLOGY (ICSICT), 2018, : 21 - 23
  • [34] 0.1-nanometer resolution positioning stage for sub-10 nm scanning probe lithography
    Vorbringer-Doroshovets, Nataliya
    Balzer, Felix
    Fuessl, Roland
    Manske, Eberhard
    Kaestner, Marcus
    Schuh, Andreas
    Zoellner, Jens-Peter
    Hofer, Manuel
    Guliyev, Elshad
    Ahmad, Ahmad
    Ivanov, Tzvetan
    Rangelow, Ivo W.
    ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES V, 2013, 8680
  • [35] Sub-10 nm Resistless Nano lithography for Directed Self-Assembly of Block Copolymers
    Fernandez-Regulez, Marta
    Evangelio, Laura
    Lorenzoni, Matteo
    Fraxedas, Jordi
    Perez-Murano, Francesc
    ACS APPLIED MATERIALS & INTERFACES, 2014, 6 (23) : 21596 - 21602
  • [36] DNA-Origami-Driven Lithography for Patterning on Gold Surfaces with Sub-10 nm Resolution
    Gallego, Isaac
    Manning, Brendan
    Prades, Joan Daniel
    Mir, Monica
    Samitier, Josep
    Eritja, Ramon
    ADVANCED MATERIALS, 2017, 29 (11)
  • [37] Multifield sub-5nm overlay in imprint lithography
    Ajay, Paras
    Cherala, Anshuman
    Yin, Bailey A.
    Moon, Euclid E.
    Pease, R. Fabian
    Pease, W.
    Sreenivasan, S. V.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2016, 34 (06):
  • [38] Sub-10 nm Carbon Nanotube Transistor
    Franklin, Aaron D.
    Han, Shu-Jen
    Tulevski, George S.
    Luisier, Mathieu
    Breslin, Chris M.
    Gignac, Lynne
    Lundstrom, Mark S.
    Haensch, Wilfried
    2011 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM), 2011,
  • [39] Fluorescence nanoscopy at the sub-10 nm scale
    Luciano A. Masullo
    Alan M. Szalai
    Lucía F. Lopez
    Fernando D. Stefani
    Biophysical Reviews, 2021, 13 : 1101 - 1112
  • [40] Challenges of SEM metrology at sub-10 nm
    Babin, Sergey
    Borisov, Sergey
    Peroz, Christophe
    Yushmanov, Peter
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXVI, PTS 1 AND 2, 2012, 8324
12345