INFLUENCE OF STRUCTURAL DISORDERING ON METAL-INSULATOR PHASE TRANSITIONS IN V4O7 AND V2O3.

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作者：
Mokerov, V.G.
Ryabinin, I.V.
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Physics of Metals and Metallography | 1981年 / 52卷 / 03期
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Thin mono- and polycrystalline films were produced from a vapor-gas mixture (VOCl//3 plus H//2 plus CO//2 plus Ar). The influence of ion bombardment on structure disordering was studied at temperatures in the range 77. 8 to 300 K. Besides electron correlation effects, electron-phonon interaction is a factor in these oxides.
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页码：168 / 172
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