Plasma oxidation of copper thin films

被引：0

作者：

机构：

[1] Iro, Wataru

[2] Shimada, Haruo

[3] Imafuku, Muneyuki

[4] Hashimoto, Misao

来源：

Iro, Wataru | 1877年 / 30期

关键词：

High Temperature Superconductors;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

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[21] Transport considerations in the plasma-assisted oxidation of copper films
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JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2004, 151 (01) : G40 - G46
[22] Low temperature growth technique for nanocrystalline cuprous oxide thin films using microwave plasma oxidation of copper
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Daniels, S.
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McNally, P. J.
MATERIALS LETTERS, 2012, 71 : 160 - 163
[23] KINETICS OF PLASMA OXIDATION OF NIOBIUM AND ALUMINUM THIN-FILMS
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DOKLADY AKADEMII NAUK BELARUSI, 1977, 21 (08): : 691 - 694
[24] PLASMA OXIDATION MECHANISMS IN TUNGSTEN SILICIDE THIN-FILMS
PEREZCASERO, R
PERRIERE, J
ENARD, JP
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[25] Plasma oxidation of electron beam evaporated cadmium thin films
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[26] OXIDATION OF THIN COPPER FILMS CONDENSED IN PRESENCE OF VARIOUS RESIDUAL GASES
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[27] LASER-INDUCED OXIDATION OF THIN CADMIUM AND COPPER-FILMS
WAUTELET, M
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[28] THE OXIDATION-KINETICS OF THIN COPPER-FILMS STUDIED BY ELLIPSOMETRY
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[29] OXIDATION OF VERY THIN COPPER-FILMS INVESTIGATED BY OPTICAL TRANSMITTANCE
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[30] OXIDATION-KINETICS OF COPPER COATED WITH THIN BISMUTH-FILMS
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BELOUSOV, VV
PROTECTION OF METALS, 1989, 25 (01): : 116 - 118

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