Structure and adhesion of ZrN films formed by reactive magnetron sputtering ion plating and dynamic ion mixing

被引：0
|
作者：
机构：
来源：
| 1600年 / American Inst of Physics, Woodbury, NY, USA卷 / 74期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [11] Deposition and Characterization of Zirconium Nitride (ZrN) Thin Films by Reactive Magnetron Sputtering With Linear Gas Ion Source and Bias Voltage
    Kavitha, A.
    Subramanian, N. Sankara
    Loganathan, S.
    Kannan, R.
    SOLID STATE PHYSICS: PROCEEDINGS OF THE 58TH DAE SOLID STATE PHYSICS SYMPOSIUM 2013, PTS A & B, 2014, 1591 : 1705 - 1707
  • [12] The effect of ion current density on the adhesion and structure of coatings deposited by magnetron sputter ion plating
    Laing, K
    Hampshire, J
    Teer, D
    Chester, G
    SURFACE & COATINGS TECHNOLOGY, 1999, 112 (1-3): : 177 - 180
  • [13] Effect of ion current density on the adhesion and structure of coatings deposited by magnetron sputter ion plating
    Teer Coatings Ltd, Worcestershire, United Kingdom
    Surf Coat Technol, 1 (177-180):
  • [14] Investigation of the physical properties of ion assisted ZrN thin films deposited by RF magnetron sputtering
    Signore, M. A.
    Valerini, D.
    Rizzo, A.
    Tapfer, L.
    Capodieci, L.
    Cappello, A.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2010, 43 (22)
  • [15] Effect of NbN and ZrN films formed by magnetron sputtering on Ti and porcelain bonding
    Wang, Shu-Shu
    Xia, Yang
    Zhang, La-Bao
    Guang, Han-Bing
    Shen, Ming
    Zhang, Fei-Min
    SURFACE & COATINGS TECHNOLOGY, 2010, 205 (07): : 1886 - 1891
  • [16] REACTIVE ION-PLATING AT LOW ION ENERGIES WITH AN UNBALANCED MAGNETRON
    HOWSON, RP
    JAFER, HA
    SPENCER, AG
    VACUUM, 1993, 44 (3-4) : 191 - 195
  • [17] Preparation of polycrystalline Ti-Al-O films by magnetron sputtering ion plating: constitution, structure and morphology
    A. v. Richthofen
    Rainer Cremer
    Ralph Domnick
    Dieter Neuschütz
    Fresenius' Journal of Analytical Chemistry, 1997, 358 : 308 - 311
  • [18] Preparation of polycrystalline Ti-Al-O films by magnetron sputtering ion plating: Constitution, structure and morphology
    vonRichthofen, A
    Cremer, R
    Domnick, R
    FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY, 1997, 358 (1-2): : 308 - 311
  • [19] TRIBOLOGY OF ZrN, CrN AND TiAlN THIN FILMS DEPOSITED BY REACTIVE MAGNETRON SPUTTERING
    Ruden, Alexander
    Gonzalez, Juan M.
    Restrepo, Johans S.
    Cano, Michell F.
    Sequeda, Federico
    DYNA-COLOMBIA, 2013, 80 (178): : 95 - 100
  • [20] Microhardness characterization of superlattices formed by reactive magnetron sputtering and ion beam assisted deposition
    Blando, E
    Hübler, R
    SURFACE & COATINGS TECHNOLOGY, 2002, 158 : 685 - 689
12345