Mass-limited, debris-free laser-plasma EUV source

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Univ of Central Florida, Orlando, United States [1 ]
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Opt Commun | / 1-6卷 / 109-112期
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The authors acknowledge useful discussions with Drs. G. Kubiak; A; Hawryluk; F. Zernicke and W.T. Silfvast; and thank Dr. J. Underwood for multilayer mirror samples; Dr. D. Kania for an X-ray diode; Dr. C. Brown for X-ray film digitization; and J. Cormier; G. Luntz and M. Nguyen for technical support. This work was supported by ARPA through contract (LLNL) B3 13948; and the State of Florida;
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