Low energy, high density plasma (ICP) for low defect etching and deposition applications on compound semiconductors

被引：0
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作者：
Etrillard, J. [1 ]
Mäher, H. [1 ]
Medjdoub, M. [1 ]
Courant, J.L. [1 ]
Nissim, Y.I. [1 ]
机构：
[1] OPTO, Groupement d'Intérêt Economique, Route de Nozay, F-91460, Marcoussis, France
来源：
Materials Research Society Symposium - Proceedings | 1999年 / 573卷
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页码：189 / 201
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