Detection of H atoms in RF-discharge SiH4, CH4 and H2 plasmas by two-photon absorption laser-induced fluorescence spectroscopy

被引：0
|
作者：
机构：
[1] Tachibana, Kunihide
来源：
Tachibana, Kunihide | 1600年 / JJAP, Minato-ku, Japan卷 / 33期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Two-Photon Absorption Laser-Induced Fluorescence Investigation of CO2 Plasmas for Mars Entry
    Marynowski, T.
    Loehle, S.
    Fasoulas, S.
    JOURNAL OF THERMOPHYSICS AND HEAT TRANSFER, 2014, 28 (03) : 394 - 400
  • [22] Study of H2/CH4 pulsed microwave discharge by time resolved spectroscopy
    de Poucques, L
    Bougdira, J
    Hugon, R
    Remy, M
    Alnot, P
    INTERNATIONAL CONFERENCE ON PHENOMENA IN IONIZED GAS, VOL I, PROCEEDINGS, 1999, : 203 - 204
  • [23] Investigations of CH4, C2H2 and C2H4 dusty RF plasmas by means of FTIR absorption spectroscopy and mass spectrometry
    Deschenaux, C
    Affolter, A
    Magni, D
    Hollenstein, C
    Fayet, P
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1999, 32 (15) : 1876 - 1886
  • [24] QUADRUPOLE MASS-SPECTROMETRIC STUDY OF POSITIVE-IONS FROM RF PLASMAS OF PURE CH4, CH4/H2, AND CH4/AR SYSTEMS
    ZHANG, W
    CATHERINE, Y
    PLASMA CHEMISTRY AND PLASMA PROCESSING, 1991, 11 (04) : 473 - 488
  • [25] LASER-INDUCED FLUORESCENCE DETECTION OF CH AND SIH RADICALS IN THE DISSOCIATIVE EXCITATION TRANSFER OF AR(P-3(2),0) WITH CH3X(X=H,CL,BR,L), SIH4, AND SI2H6
    SEKIYA, H
    OBASE, H
    NISHIMURA, Y
    NIPPON KAGAKU KAISHI, 1989, (08) : 1210 - 1216
  • [26] MASS-SPECTROMETRY DETECTION OF RADICALS IN SIH4-CH4-H-2 GLOW-DISCHARGE PLASMAS
    KAENUNE, P
    PERRIN, J
    GUILLON, J
    JOLLY, J
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 1995, 4 (02): : 250 - 259
  • [27] Effect of laser property fluctuations over multipulses on H atom measurement by two-photon absorption laser-induced fluorescence
    Duan, XR
    Lange, H
    JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS, 2004, 37 (02) : 427 - 434
  • [28] Characteristics of carbon-related materials deposited in electron-energy controlled CH4/H2 RF discharge plasmas
    Emi, Junichi
    Iizuka, Satoru
    DIAMOND AND RELATED MATERIALS, 2011, 20 (04) : 568 - 572
  • [29] Growth of silicon carbide thin films by hot-wire chemical vapor deposition from SiH4/CH4/H2
    Tabata, Akimori
    Komura, Yusuke
    Narita, Tomoki
    Kondo, Akihiro
    THIN SOLID FILMS, 2009, 517 (12) : 3516 - 3519
  • [30] Different discharge regimes in a microwave cavity coupling system used for the generation of moderate pressure H2 and H2/CH4 plasmas
    Hassouni, K
    Grotjohn, TA
    Gicquel, A
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2002, 30 (01) : 172 - 173
12345