STUDY OF THE SURFACE LAYERS OF GROUP IVA METALS WITH IMPLANTED SILICON IONS.

被引:0
|
作者
Kovneristyi, Yu.K.
Vavilova, V.V.
Krasnopertsev, V.V.
Galkin, L.N.
Kudyshev, A.N.
Klechkovskaya, V.V.
机构
来源
Neorganiceskie materialy | 1987年 / 23卷 / 06期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
9
引用
收藏
页码:932 / 936
相关论文
共 50 条
  • [32] A model for the formation of donor centers in silicon layers implanted with erbium and oxygen ions
    Aleksandrov, OV
    Zakhar'in, AO
    SEMICONDUCTORS, 2002, 36 (11) : 1209 - 1214
  • [33] A model for the formation of donor centers in silicon layers implanted with erbium and oxygen ions
    O. V. Aleksandrov
    A. O. Zakhar’in
    Semiconductors, 2002, 36 : 1209 - 1214
  • [34] Formation of Submicron n+-Layers in Silicon Implanted with H+-Ions
    Pokotilo, Y. M.
    Petukh, A. N.
    Giro, A. V.
    Wegierek, P.
    ACTA PHYSICA POLONICA A, 2011, 120 (01) : 129 - 132
  • [35] CHARACTERIZATION BY NUCLEAR AND SPECTROPHOTOMETRIC ANALYSIS OF NEAR-SURFACE MODIFICATIONS OF GLASS IMPLANTED WITH HEAVY IONS.
    Polato, Pietro
    Mazzoldi, Paolo
    Boscoletto, Angelo Boscolo
    1600, (70):
  • [36] Role of oxygen in the formation of surface layers on steel implanted with argon ions
    Bayankin, VY
    Bubnov, AD
    Gilmutdinov, FZ
    Kanunnikova, OM
    INORGANIC MATERIALS, 1996, 32 (12) : 1303 - 1305
  • [37] Studying Near-Surface Layers of Germanium Implanted with Cobalt Ions
    Bazarov, V. V.
    Shustov, V. A.
    Lyadov, N. M.
    Faizrakhmanov, I. A.
    Yanilkin, I., V
    Khantimerov, S. M.
    Garipov, R. R.
    Fatykhov, R. R.
    Suleimanov, N. M.
    Valeev, V. F.
    TECHNICAL PHYSICS LETTERS, 2019, 45 (10) : 1047 - 1049
  • [38] Studying Near-Surface Layers of Germanium Implanted with Cobalt Ions
    V. V. Bazarov
    V. A. Shustov
    N. M. Lyadov
    I. A. Faizrakhmanov
    I. V. Yanilkin
    S. M. Khantimerov
    R. R. Garipov
    R. R. Fatykhov
    N. M. Suleimanov
    V. F. Valeev
    Technical Physics Letters, 2019, 45 : 1047 - 1049
  • [39] STRENGTHENING MECHANISMS OF SURFACE AND NEAR-SURFACE LAYERS IN ION-IMPLANTED METALS
    RADZHABOV, TD
    RAKHIMOVA, GR
    IZVESTIYA AKADEMII NAUK SERIYA FIZICHESKAYA, 1994, 58 (03): : 173 - 178
  • [40] Study of the Distribution Profile of Iron Ions Implanted into Silicon
    Kozhemyako, A. V.
    Balakshin, Yu. V.
    Shemukhin, A. A.
    Chernysh, V. S.
    SEMICONDUCTORS, 2017, 51 (06) : 745 - 750