THREE-DIMENSIONAL DEVELOPMENT OF ELECTRON BEAM EXPOSED RESIST PATTERNS SIMULATED BY USING RAY TRACING MODEL.

被引：0
|
作者：
Li, Jin [1 ]
Wang, Jian-kun [1 ]
Wang, Shao-jun [1 ]
机构：
[1] Shandong Polytechnic Univ, Jinan, China, Shandong Polytechnic Univ, Jinan, China
来源：
Microelectronic Engineering | 1987年 / 6卷 / 1-4期
关键词：
D O I：
10.1016/0167-9317(87)90030-X
中图分类号：
学科分类号：
摘要：
6
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页码：147 / 151
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