Effect of laser-ablation process parameters and post-annealing treatment on ferroelectric PZT thin films

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作者：
Lappalainen, Jyrki [1 ]
Frantti, Johannes [1 ]
Lantto, Vilho [1 ]
机构：
[1] Microlectron. and Mat. Phys. Labs., University of Oulu, P.O. Box 444, FIN-90571 Oulu, Finland
来源：
Applied Surface Science | 1999年 / 142卷 / 01期
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页码：407 / 412
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