HOPPING CONDUCTION AND DEFECT STATES IN REACTIVELY SPUTTERED SILICON NITRIDE THIN FILMS.

被引:0
|
作者
Gier, L. [1 ]
Scharmann, A. [1 ]
Schalch, D. [1 ]
机构
[1] Justus-Leibig-Univ Giessen, Giessen, West Ger, Justus-Leibig-Univ Giessen, Giessen, West Ger
来源
关键词
D O I
暂无
中图分类号
学科分类号
摘要
SILICON NITRIDE
引用
收藏
页码:605 / 610
相关论文
共 50 条
  • [41] Characteristics of reactively sputtered niobium nitride thin films as diffusion barriers for Cu metallization
    Huang, Cheng-Lin
    Lai, Chih-Huang
    Tsai, Po-Hao
    Huang, Hsing-An
    Lin, Jing-Cheng
    Lee, Chiapyng
    ELECTRONIC MATERIALS LETTERS, 2013, 9 (05) : 593 - 597
  • [42] OPTICAL-PROPERTIES AND MICROSTRUCTURE OF REACTIVELY SPUTTERED INDIUM NITRIDE THIN-FILMS
    SULLIVAN, BT
    PARSONS, RR
    WESTRA, KL
    BRETT, MJ
    JOURNAL OF APPLIED PHYSICS, 1988, 64 (08) : 4144 - 4149
  • [43] Electrical conduction mechanism in silicon nitride and oxy-nitride-sputtered thin films -: art. no. 113710
    Vila, M
    Román, E
    Prieto, C
    JOURNAL OF APPLIED PHYSICS, 2005, 97 (11)
  • [44] STRESS DEPENDENCE OF REACTIVELY SPUTTERED ALUMINUM NITRIDE THIN-FILMS ON SPUTTERING PARAMETERS
    HUFFMAN, GL
    FAHNLINE, DE
    MESSIER, R
    PILIONE, LJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 2252 - 2255
  • [45] PERPENDICULAR MAGNETIC-ANISOTROPY OF REACTIVELY SPUTTERED COBALT NITRIDE THIN-FILMS
    MATSUOKA, M
    ONO, K
    INUKAI, T
    IEEE TRANSACTIONS ON MAGNETICS, 1987, 23 (05) : 2788 - 2790
  • [46] Characteristics of reactively sputtered niobium nitride thin films as diffusion barriers for Cu metallization
    Cheng-Lin Huang
    Chih-Huang Lai
    Po-Hao Tsai
    Hsing-An Huang
    Jing-Cheng Lin
    Chiapyng Lee
    Electronic Materials Letters, 2013, 9 : 593 - 597
  • [47] MOSSBAUER CHARACTERIZATION OF REACTIVELY SPUTTERED IRON NITRIDE FILMS
    LO, C
    KRISHNASWAMY, SV
    MESSIER, R
    RAO, KRPM
    MULAY, LN
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02): : 313 - 317
  • [48] REACTIVELY SPUTTERED VANADIUM DIOXIDE THIN FILMS
    FULS, EN
    HENSLER, DH
    ROSS, AR
    APPLIED PHYSICS LETTERS, 1967, 10 (07) : 199 - &
  • [49] CARRIER CONDUCTION IN THIN SILICON-NITRIDE FILMS
    SUZUKI, E
    HIRAISHI, H
    ISHII, K
    HAYASHI, Y
    APPLIED PHYSICS LETTERS, 1982, 40 (08) : 681 - 683
  • [50] Nitrogen profiles of thin sputtered PVD silicon nitride films
    Markwitz, A., 1600, (44): : 3 - 4