PLASMA FOCUS AS A RADIATION SOURCE FOR X-RAY LITHOGRAPHY.

被引：4
|
作者：
Eberle, J. [1 ]
Krompholz, H. [1 ]
Lebert, R. [1 ]
Neff, W. [1 ]
Noll, R. [1 ]
机构：
[1] Fraunhofer Inst fuer Lasertechnik, Aachen, West Ger, Fraunhofer Inst fuer Lasertechnik, Aachen, West Ger
来源：
Microelectronic Engineering | 1985年 / 3卷 / 1-4期
关键词：
D O I：
10.1016/0167-9317(85)90075-9
中图分类号：
学科分类号：
摘要：
LITHOGRAPHY
引用
收藏
页码：611 / 613
相关论文
共 50 条
  • [31] Dense plasma focus PACO as a hard X-ray emitter: a study on the radiation source
    Supan, L.
    Guichon, S.
    Milanese, M.
    Niedbalski, J.
    Moroso, R.
    Acuna, H.
    Malamud, F.
    15TH INTERNATIONAL CONGRESS ON PLASMA PHYSICS (ICPP2010) & 13TH LATIN AMERICAN WORKSHOP ON PLASMA PHYSICS (LAWPP2010), 2014, 511
  • [32] PROPERTIES OF A LASER-PLASMA X-RAY SOURCE FOR X-RAY-LITHOGRAPHY
    CRAWFORD, EA
    HOFFMAN, AL
    ALBRECHT, GF
    SOGARD, MR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (06): : 1575 - 1587
  • [33] Low-energy repetitive plasma focus based neon soft x-ray lithography source
    Kalaiselvi, S. M. P.
    Tan, T. L.
    Talebitaher, A.
    Lee, P.
    Rawat, R. S.
    ADVANCES IN X-RAY/EUV OPTICS AND COMPONENTS IX, 2014, 9207
  • [34] Preliminary results on x-ray lithography using a compact plasma focus
    Lee, S
    Feng, X
    Zhang, GX
    Lee, P
    Liu, MH
    Serban, A
    Springham, SV
    Wong, TKS
    Wira, K
    Selvam, C
    Thang, A
    MICROLITHOGRAPHIC TECHNIQUES IN IC FABRICATION, 1997, 3183 : 123 - 127
  • [35] THE PLASMA-FOCUS AS SOFT-X-RAY SOURCE FOR MICROSCOPY AND LITHOGRAPHY
    NEFF, W
    EBERLE, J
    HOLZ, R
    LEBERT, R
    RICHTER, F
    X-RAY INSTRUMENTATION IN MEDICINE AND BIOLOGY, PLASMA PHYSICS, ASTROPHYSICS, AND SYNCHROTRON RADIATION, 1989, 1140 : 13 - 20
  • [36] A novel X-ray mask concept for mix&match lithography fabrication of MOS devices by synchrotron radiation lithography.
    DiFabrizio, E
    Grella, L
    Gentili, M
    Baciocchi, M
    Mastrogiacomo, L
    Choi, SS
    Jeon, YJ
    Yoo, HJ
    Chung, HB
    MICROELECTRONIC ENGINEERING, 1997, 35 (1-4) : 553 - 556
  • [37] NEW X-RAY SOURCE FOR LITHOGRAPHY
    SPRANGLE, P
    HAFIZI, B
    MAKO, F
    APPLIED PHYSICS LETTERS, 1989, 55 (24) : 2559 - 2560
  • [38] X-RAY-SPECTRA IN A GAS PUFF PLASMA X-RAY SOURCE FOR X-RAY-LITHOGRAPHY
    ITABASHI, S
    OKADA, I
    SAITOH, Y
    YOSHIHARA, H
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (04): : 633 - 639
  • [39] X-ray lithography. Novel fabrication process for SiC/W steppermasks
    Luethje, H., 1600, (28):
  • [40] X-RAY RADIATION SOURCE FOR LASER PLASMA TRANSLUCENCE
    IVANOV, YS
    SKLIZKOV, GV
    RYUKKERT, VV
    FEDOTOV, SI
    ZHURNAL TEKHNICHESKOI FIZIKI, 1972, 42 (07): : 1423 - &
12345