Electron beam deposition of nanostructures

被引：0
|
作者：
Valiev, K.A. [1 ]
Velikov, L.V. [1 ]
Zhikharev, E.N. [1 ]
Sheremet'ev, M.N. [1 ]
机构：
[1] Fiziko-Tekhnologicheskij Inst RAN, Moscow, Russia
来源：
Mikroelektronika | 1995年 / 24卷 / 03期
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页码：172 / 178
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