Nature of metallic contamination on various silicon substrates

被引:0
|
作者
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University [1 ]
不详 [2 ]
机构
关键词
Crystalline silicon - Native oxide;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:1839 / 1845
相关论文
共 50 条
  • [41] Mechanisms of metallic impurity deposition on silicon substrates dipped in cleaning solution
    Mouche, L., 1600, Electrochemical Soc Inc, Pennington, NJ, United States (142):
  • [42] Metallic-Contamination-Induced Optical Loss in Silicon Microphotonic Waveguides.
    Barwicz, Tymon
    Holzwarth, Charles W.
    Rakich, Peter T.
    Popovic, Milos A.
    Ippen, Erich I.
    Smith, Henry I.
    2007 CONFERENCE ON LASERS & ELECTRO-OPTICS/QUANTUM ELECTRONICS AND LASER SCIENCE CONFERENCE (CLEO/QELS 2007), VOLS 1-5, 2007, : 522 - +
  • [43] THE EFFECT OF METALLIC CONTAMINATION ON ENHANCED OXYGEN DIFFUSION IN SILICON AT LOW-TEMPERATURES
    NEWMAN, RC
    TIPPING, AK
    TUCKER, JH
    JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1985, 18 (27): : L861 - L866
  • [44] A flow-channel cell for measurement of metallic contamination in silicon wafer processing
    Matlosz, M
    Berend, P
    Coutelle, D
    Simon, P
    PROCEEDINGS OF THE SYMPOSIUM ON CRYSTALLINE DEFECTS AND CONTAMINATION: THEIR IMPACT AND CONTROL IN DEVICE MANUFACTURING II, 1997, 97 (22): : 411 - 423
  • [45] Effect of weak metallic contamination on silicon epitaxial layer and gate oxide integrity
    Mello, D.
    Coccorese, C.
    Ferlito, E.
    Sciuto, G.
    Ricciari, R.
    Barbarino, P.
    Astuto, M.
    CRYSTAL RESEARCH AND TECHNOLOGY, 2011, 46 (08) : 805 - 808
  • [46] RF plasma cleaning of silicon substrates with high-density polyethylene contamination
    Cagomoc, Charisse Marie D.
    De Leon, Mark Jeffry D.
    Ebuen, Anna Sophia M.
    Gilos, Marlo Nicole R.
    Vasquez, Magdaleno R., Jr.
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2018, 57 (01)
  • [47] Removal efficiency of metallic impurities on various substrates in HF-based solutions
    Choi, GM
    Ohmi, T
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2001, 148 (05) : G241 - G248
  • [48] Development of polycrystalline silicon films on flexible metallic substrates by aluminium induced crystallization
    Prathap, P.
    Slaoui, A.
    Ducros, C.
    Baclet, N.
    Reydet, P. L.
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2009, 97 (01): : 45 - 54
  • [49] Electrical characterization of dielectrically isolated silicon substrates containing buried metallic layers
    Goh, WL
    Montgomery, JH
    Raza, SH
    Armstrong, BM
    Gamble, HS
    IEEE ELECTRON DEVICE LETTERS, 1997, 18 (05) : 232 - 234
  • [50] Thin p-type microcrystalline silicon film on various substrates
    Rath, JK
    Wallinga, J
    Schropp, REI
    AMORPHOUS SILICON TECHNOLOGY - 1996, 1996, 420 : 271 - 276