THICKNESS DISTRIBUTION DETERMINATION OF THIN SPUTTERED TOP LAYERS ON BULK METAL COLLECTORS BY ELECTRON BACKSCATTERING.

被引：0

作者：

Erlenwein, P.

Hohn, F.J.

Niedrig, H.

机构：

来源：

Optik (Jena) | 1977年 / 49卷 / 03期

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摘要：

A method for the determination of thickness distributions of thin top layers on large area bulk collector foils by electron backscattering is described. As an example the determination of the thickness distribution of a sputtered gold film on an aluminium collector foil is shown.

引用

页码：357 / 363

共 11 条

[1] THICKNESS DISTRIBUTION DETERMINATION OF THIN SPUTTERED TOP LAYERS ON BULK METAL COLLECTORS BY ELECTRON BACKSCATTERING
ERLENWEIN, P
HOHN, FJ
NIEDRIG, H
OPTIK, 1977, 49 (03): : 357 - 363
[2] ELECTRON BACKSCATTERING BY THIN TOP LAYERS ON BULK MATERIALS
HOHN, FJ
KINDT, M
NIEDRIG, H
STUTH, B
OPTIK, 1976, 46 (04): : 491 - 500
[3] Electron Backscattering by Thin Layers Deposited on Bulk Substrate.
Hohn, F.J.
Kindt, M.
Niedrig, H.
Stuth, B.
Optik (Jena), 1976, 46 (04): : 491 - 500
[4] ELECTRON BACKSCATTERING MEASUREMENTS FOR THICKNESS DETERMINATION OF THIN-FILMS ON MASSIVE CARRIERS
HOHN, FJ
KINDT, M
NIEDRIG, H
MIKROSKOPIE, 1976, 32 (5-6) : 179 - 179
[5] DETERMINATION OF LAYER THICKNESS DISTRIBUTION OF SPUTTERING SPOT PATTERNS USING ELECTRON BACKSCATTERING
ERLENWEIN, P
NIEDRIG, H
MIKROSKOPIE, 1978, 34 (5-6) : 189 - 189
[6] DETERMINATION OF THE ELECTRON BACKSCATTERING COEFFICIENT FOR THIN-FILMS USING DOUBLE-LAYERS
NEUBERT, G
ROGASCHEWSKI, S
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1983, 75 (02): : K191 - K193
[7] THICKNESS DETERMINATION OF METAL COAT LAYERS BY ELECTRON-BEAM MICROSONICS
NEFF, R
WEISWEILER, W
MIKROSKOPIE, 1980, 36 (11-1) : 350 - 350
[8] DETERMINATION OF THICKNESS OF THIN-LAYERS SPUTTERED ON GLASS TUBES BY INSTRUMENTAL NEUTRON-ACTIVATION ANALYSIS
LAVI, N
WOLFMAN, D
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1987, 259 (03): : 580 - 582
[9] POSSIBLE DETERMINATION OF THICKNESS IN THIN LAYERS FROM MASS DISTRIBUTION AND ROENTGENOGRAPHIC INTERFEROMETRY
STRUNK, R
WERNICKE, R
ARCHIV FUR TECHNISCHES MESSEN UND INDUSTRIELLE MESSTECHNIK, 1971, (421): : R13 - &
[10] THICKNESS DETERMINATION OF THIN OXIDE LAYERS AT THE BOTTOM OF CONTACT HOLES OF SEMICONDUCTOR-DEVICES BY AUGER-ELECTRON SPECTROSCOPY
PAMLER, W
MATHUNI, J
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (01): : 12 - 18

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