Electrical properties of oxynitride thin films using noise and charge pumping measurements

被引：0
|
作者：
Masson, P. [1 ,2 ]
Morfouli, P. [1 ]
Autran, J.L. [2 ]
Brini, J. [1 ]
Balland, B. [2 ]
Vogel, E.M. [3 ]
Wortman, J.J. [3 ]
机构：
[1] LPCS, ENSERG, BP 257, 38016 Grenoble, France
[2] LPM, INSA de Lyon, Bâtiment 502, 69621 Villeurbanne, France
[3] DECE, NCSU, 404 Daniels Hall, Box 7911, Raleigh, NC 27695-711, United States
来源：
Journal of Non-Crystalline Solids | 1999年 / 245卷
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：54 / 58
相关论文
共 50 条
  • [31] CHARGE-TRANSFER AND ELECTRIC HARDNESS OF SILICON OXYNITRIDE THIN-FILMS
    KUBRIN, VI
    KORZO, VF
    DOROFEYEVA, EG
    KACHARAVA, MV
    IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII FIZIKA, 1983, 26 (11): : 56 - 60
  • [32] Structural and dielectric properties of oxynitride perovskite LaTiOxNy thin films
    Ziani, A.
    Le Paven-Thivet, C.
    Le Gendre, L.
    Fasquelle, D.
    Carru, J. C.
    Tessier, F.
    Pinel, J.
    THIN SOLID FILMS, 2008, 517 (02) : 544 - 549
  • [33] NOISE MEASUREMENTS IN YBACUO THIN-FILMS
    KOH, GH
    MOON, SH
    LEE, HJ
    KHIM, ZG
    PHYSICA C, 1991, 185 : 1813 - 1814
  • [34] MEASUREMENTS OF EXCESS NOISE IN THIN GERMANIUM FILMS
    MORCOM, WR
    CHEN, TM
    SOLID-STATE ELECTRONICS, 1971, 14 (04) : 337 - &
  • [35] MEASUREMENTS ON THE ELECTRICAL RESISTIVITY OF THIN NICKEL FILMS
    VANITTERBEEK, A
    DEGREVE, L
    EXPERIENTIA, 1947, 3 (07): : 278 - 279
  • [36] MEASUREMENTS ON THE ELECTRICAL RESISTIVITY OF THIN METALLIC FILMS
    VANITTERBEEK, A
    DEGREVE, L
    PHYSICA, 1949, 15 (1-2): : 80 - 82
  • [37] Structural, optical and electrical properties of reactively sputtered iron oxynitride films
    Petitjean, C.
    Grafoute, M.
    Pierson, J. F.
    Rousselot, C.
    Banakh, O.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2006, 39 (09) : 1894 - 1898
  • [38] Etching of oxynitride thin films using inductively coupled plasma
    Kim, B
    Lee, D
    Kim, NJ
    Lee, BT
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2005, 23 (03): : 520 - 524
  • [39] ELECTRICAL-PROPERTIES OF LASER DEPOSITED ALUMINUM OXYNITRIDE FILMS ON INP
    THOMPSON, LR
    SHENG, TY
    HWANG, T
    COLLINS, GJ
    JOURNAL OF ELECTRONIC MATERIALS, 1986, 15 (05) : 305 - 305
  • [40] Charge defects-induced electrical properties in bismuth ferrite bilayered thin films
    Wu, Jiagang
    Zhang, Binyu
    Wang, Xiaopeng
    Wang, John
    Zhu, Jianguo
    Xiao, Dingquan
    MATERIALS RESEARCH BULLETIN, 2013, 48 (08) : 2973 - 2977
12345