Self-aligned phase shifting mask for contact hole fabrication

被引：0
|
作者：
Todokoro, Y.
Watanabe, H.
Hirai, Y.
Nomura, N.
Inoue, M.
机构：
来源：
Proceedings of the International Conference on Microlithography | 1991年
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] SELF-ALIGNED CONTACT PROCESS FOR MANUFACTURING VLSI CIRCUITS
    KHAN, MK
    GODEJAHN, GC
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (08) : C371 - C371
  • [22] A scalable self-aligned contact NOR flash technology
    Wei, M.
    Banerjee, R.
    Zhang, L.
    Masad, A.
    Reidy, S.
    Ahn, J.
    Chao, H.
    Lim, C.
    Castro, T.
    Karpenko, O.
    Ru, M.
    Fastow, R.
    Brand, A.
    Guo, X.
    Gorman, J.
    McMahon, W. J.
    Woo, B. J.
    Fazio, A.
    2007 SYMPOSIUM ON VLSI TECHNOLOGY, DIGEST OF TECHNICAL PAPERS, 2007, : 226 - +
  • [23] Substrate temperature effects on 193 nm photoresist deformation and self-aligned contact hole etching performances
    Kim, Myeong-Cheol
    Bai, Keun-Hee
    Kang, Chang-Jin
    Cho, Han-Ku
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (05): : 2331 - 2336
  • [24] SELF-ALIGNED CONTACT PROCESS USING AN ION-IMPLANTED SILICON NITRIDE FILM AS AN OXIDATION MASK.
    Lai, F.S.
    IBM technical disclosure bulletin, 1984, 26 (08): : 4303 - 4307
  • [25] Mask Defect Printability in the Self-Aligned Quadruple Patterning (SAQP) process
    Furubayashi, Ken
    Sho, Koutarou
    Miyoshi, Seiro
    Yamaguchi, Shinji
    Iida, Kazunori
    Usui, Satoshi
    Morisaki, Tsuyoshi
    Sato, Naoki
    Mukai, Hidefumi
    OPTICAL MICROLITHOGRAPHY XXIX, 2016, 9780
  • [26] The fabrication of self-aligned InAs nanostructures on GaAs(331)A substrates
    Gong, Z
    Fang, ZD
    Xu, XH
    Miao, ZH
    Ni, HQ
    Niu, ZC
    Feng, SL
    JOURNAL OF PHYSICS-CONDENSED MATTER, 2004, 16 (01) : 29 - 35
  • [27] Fabrication of high-resolution, self-aligned palladium electrodes
    Jenni, Laura Vera
    Weichart, Johannes
    Muoth, Matthias
    Chikkadi, Kiran
    Haluska, Miroslav
    Hierold, Christofer
    MICROELECTRONIC ENGINEERING, 2016, 153 : 105 - 109
  • [28] A novel method for fabrication of self-aligned double microlens arrays
    Ho, Jeng-Rong
    Shih, Teng-Kai
    Cheng, J. W. John
    Sung, Cheng-Kuo
    Chen, Chia-Fu
    SENSORS AND ACTUATORS A-PHYSICAL, 2007, 135 (02) : 465 - 471
  • [29] Self-Aligned Block and Fully Self-Aligned Via for iN5 Metal 2 Self-Aligned Quadruple Patterning
    Vincent, Benjamin
    Franke, Joern-Holger
    Juncker, Aurelie
    Lazzarino, Frederic
    Murdoch, Gayle
    Halder, Sandip
    Ervin, Joseph
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY IX, 2018, 10583
  • [30] Self-aligned fabrication of vertical, fin-based structures
    Perozek, Joshua
    Palacios, Tomas
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2024, 42 (06):
12345