Improved extrapolation method of ultrathin oxide thickness using C-V characteristics of metal-oxide-semiconductor device

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[1] Yang, Hyundoek
[2] Chang, Hyo Sik
[3] Hwang, Hyunsang
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Yang, H. (hwanghs@kjist.ac.kr) | 1600年 / Japan Society of Applied Physics卷 / 41期
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