Radical fluxes in electron cyclotron resonance plasma chemical vapor deposition of amorphous silicon

被引：0
|
作者：
Zhang, Mei [1 ]
Nakayama, Yoshikazu [1 ]
机构：
[1] Univ of Osaka Prefecture, Osaka, Japan
来源：
| 1600年 / JJAP, Minato-ku, Japan卷 / 34期
关键词：
802.3 Chemical Operations - 922.2 Mathematical Statistics - 932.3 Plasma Physics - 933.2 Amorphous Solids;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
18
引用
收藏
相关论文
共 50 条
  • [21] Effects of composition on the microstructures and optical properties of hydrogenated amorphous silicon carbide films prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition
    Chan, LH
    Chou, WZ
    Chou, LH
    AMORPHOUS AND NANOSTRUCTURED CARBON, 2000, 593 : 535 - 540
  • [22] Amorphous and microcrystalline silicon deposited by low-power electron-cyclotron resonance plasma-enhanced chemical-vapor deposition
    Conde, Joao Pedro
    Schotten, Volker
    Arekat, Safwan
    Brogueira, Pedro
    Sousa, Rui
    Chu, Virginia
    1997, JJAP, Minato-ku, Japan (36):
  • [23] Microstructure and dielectric properties of silicon nitride films deposited by electron cyclotron resonance plasma chemical vapor deposition
    Ye, C
    Ning, ZY
    Shen, MR
    Cheng, SH
    Gan, ZQ
    JOURNAL OF APPLIED PHYSICS, 1998, 83 (11) : 5978 - 5984
  • [24] Improved hydrogenated amorphous silicon thin films by photon assisted microwave electron cyclotron resonance chemical vapor deposition
    Song, YJ
    Anderson, WA
    APPLIED PHYSICS LETTERS, 1999, 74 (01) : 67 - 69
  • [25] Microcrystalline silicon films deposited by electron cyclotron resonance plasma chemical vapor deposition using helium gas
    Lee, KE
    Lee, WH
    Shin, SC
    Lee, CC
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1996, 35 (10A): : L1241 - L1244
  • [26] SILICON DIOXIDE FILMS DEPOSITED BY ELECTRON-CYCLOTRON RESONANCE PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION
    ANDOSCA, RG
    VARHUE, WJ
    ADAMS, E
    JOURNAL OF APPLIED PHYSICS, 1992, 72 (03) : 1126 - 1132
  • [27] Silicon nitride thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition
    Lapeyrade, M
    Besland, MP
    Meva'a, C
    Sibaï, A
    Hollinger, G
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1999, 17 (02): : 433 - 444
  • [28] Improved hydrogenated amorphous silicon thin films by photon assisted microwave electron cyclotron resonance chemical vapor deposition
    Appl Phys Lett, 1 (67):
  • [29] Low temperature deposition of silicon nitride films by distributed electron cyclotron resonance plasma-enhanced chemical vapor deposition
    J Vac Sci Technol A, 6 (2900):
  • [30] Mechanical properties of amorphous carbon nitride films synthesized by electron cyclotron resonance microwave plasma chemical vapor deposition
    Chan, WC
    Fung, MK
    Lai, KH
    Bello, I
    Lee, ST
    Lee, CS
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1999, 254 : 180 - 185
12345