Radical fluxes in electron cyclotron resonance plasma chemical vapor deposition of amorphous silicon

被引：0
|
作者：
Zhang, Mei [1 ]
Nakayama, Yoshikazu [1 ]
机构：
[1] Univ of Osaka Prefecture, Osaka, Japan
来源：
| 1600年 / JJAP, Minato-ku, Japan卷 / 34期
关键词：
802.3 Chemical Operations - 922.2 Mathematical Statistics - 932.3 Plasma Physics - 933.2 Amorphous Solids;
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暂无
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学科分类号：
摘要：
18
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