Proximity effect correction in projection electron beam lithography (scattering with angular limitation projection electron-beam lithography)

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作者：
Liddle, J.Alexander [1 ]
Watson, G.Patrick [1 ]
Berger, Steven D. [1 ]
Miller, Peter D. [1 ]
机构：
[1] AT&T Bell Lab, Murray Hill, United States
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1995年 / 34卷 / 12 B期
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页码：6672 / 6678
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