Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films

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作者：
Aarik, J. [1 ]
Aidla, A. [1 ]
Kiisler, A.-A. [1 ]
Uustare, T. [1 ]
Sammelselg, V. [2 ]
机构：
[1] Institute of Materials Science, Univ. Tartu, 18 Ulikooli St., EE2400, Tartu, Estonia
[2] Institute of Physics, Univ. of Tartu, 142 Riia St., EE2400, Tartu, Estonia
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Thin Solid Films | / 340卷 / 01期
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页码：110 / 116
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