Low-temperature deposition of AlN films

被引：0
|
作者：
Sun, Jian [1 ]
Wu, Jiada [1 ]
Ying, Zhifeng [1 ]
Shi, Wei [1 ]
Ling, Hao [1 ]
Zhou, Zhuying [1 ]
Ding, Xunmin [1 ]
Wang, Kanglin [1 ]
Li, Fuming [1 ]
机构：
[1] Fudan Univ, Shanghai, China
来源：
Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors | 2000年 / 21卷 / 09期
关键词：
Low temperature deposition;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
(Edited Abstract)
引用
收藏
页码：914 / 917
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