EFFECT OF HYDROGEN PRESSURE ON THE DEPOSITION OF AMORPHOUS SILICON FILMS BY TETRODE rf SPUTTERING.

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作者：
Gekka, Yasuo [1 ]
Asai, Hiroshi [1 ]
Temma, Tsuyoshi [1 ]
Yasumura, Yoh-ichi [1 ]
机构：
[1] Tokai Univ, Kanagawa, Jpn, Tokai Univ, Kanagawa, Jpn
来源：
Applications of surface science | 1984年 / 22-23卷
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7
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页码：899 / 907
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