Simulation and experimental study of gray-tone lithography for the fabrication of arbitrarily shaped surfaces

被引：0
|
作者：
Henke, W. [1 ]
Hoppe, W. [1 ]
Quenzer, H.J. [1 ]
Staudt-Fischbach, P. [1 ]
Wagner, B. [1 ]
机构：
[1] Fraunhofer-Inst for Silicon, Technology (ISiT), Berlin, Germany
来源：
Proceedings of the IEEE Micro Electro Mechanical Systems | 1994年
关键词：
Components - Fabrication - Masks - Mathematical models - Semiconducting silicon - Structure (composition) - Surfaces;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
This paper reports on a study of a methodology for fabrication of arbitrarily shaped silicon structures using technologies common to standard IC manufacturing processes. Particular emphasis is put on the design and use of halftone transmission masks for the lithography step required in the fabrication process of mechanical, optical or electronics components. The experimental investigation and the design of gray-tone masks was supported by lithography simulation. Results are presented for both, simulated gray-tone patterns as well as experimental trials.
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页码：205 / 210
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